Events The 2nd International Electronic Conference on Processes

Event submissions

Published

10.3390/ECP2023-14631

This submission belongs to the session S4. Chemical Processes and Systems of the event The 2nd International Electronic Conference on Processes

Published date

17 May, 2023

Academic Editor

Gade Pandu Rangaiah

Citation

SACHIN MAROTRAO SHENDOKAR, Shyam Aravamudhan, Moha Feroz Hossen, Swapnil Nalawade, Shobha Mantrip-r-agada, Predictive Evaluation of Atomic Layer Deposition Characteristics for Deposition of Al<sub>2</sub>O<sub>3</sub> thin films, in Proceedings of The 2nd International Electronic Conference on Processes, 17 May–31 May 2023, MDPI: Basel, Switzerland, doi: 10.3390/ECP2023-14631

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Predictive Evaluation of Atomic Layer Deposition Characteristics for Deposition of Al2O3 thin films

SACHIN MAROTRAO SHENDOKAR ¹

Moha Feroz Hossen ¹

Swapnil Nalawade ¹

Shobha Mantrip-r-agada ¹

Shyam Aravamudhan ¹

1. Joint School of Nanoscience and Nanoengineering, North Carolina A & T State University, Greensboro, USA

Abstract

Keywords

Atomic Layer Deposition

thin films

Design of Experiment

Predictive Evaluation

spectroscopic ellipsometry

Manuscript

Updated 0518 engproc-072049-original-Predictive Evaluation-of-Atomic-Layer-Deposition-Characteristics-for-Synthesis-of-Al2O3-thin-films-.pdf