Events10th International Electronic Conference on Sensors and Applications
Published
This submission belongs to the session S3. Electronic Sensors, Devices and Systems of the event 10th International Electronic Conference on Sensors and Applications
Published date
15 Nov, 2023
Academic Editor
author-avatarJean-marc Laheurte
Citation
Zeynab Alipour, Mehdi Fardmanesh, Seyed Iman Mirzaei, Design, Fabrication and Characterization of Wide-Band Metamaterial Absorber for THz Imaging, in Proceedings of 10th International Electronic Conference on Sensors and Applications, 15 November–30 November 2023, MDPI: Basel, Switzerland, doi: 10.3390/ecsa-10-16210
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Design, Fabrication and Characterization of Wide-Band Metamaterial Absorber for THz Imaging

Seyed Iman Mirzaei 2
1. Electrical Engineering Department, Sharif University of Technology, Iran
2. Department of Condensed Matter Physic, Faculty of Basic Sciences, Tarbiat Modares University, Iran
Abstract

In this paper, designs and optimization of wideband THz metamaterial absorbers (MMA) is proposed. By simulation, we reached four structures with absorptions higher than 50%, 70%, 80%, and 90% with relative absorption bandwidths (RABW) of 1.43, 1.29, 0.93, and 0.72, respectively. Terahertz absorbers can be used in many potential applications such as in imaging, energy harvesting, scattering reduction, and thermal sensing. Our intended application is to use an optimal absorber on a thermal detector for the detectivity in a wide THz range. Since a broadband absorption in the range of 0.3 to 2 terahertz is considered for use in medical imaging, the MMA with more than 50% absorption in the range of 0.35-2.1 THz has been selected to be achieved. The designs are also intended to have the capability to be implemented on different devices such as bolometers. The cost of the fabrication of the proposed absorbers is also low, because of the implementation of single-layer MMA design, and utilization of affordable and more accessible materials and techniques. Our proposed structure has a minimum feature size of 3 μm making the fabrication process convenient using the standard photolithography method as well. We used thin layers of Nickel as a metal for both single-layer pattern and ground layer which are placed on the front and back sides of the structure respectively. The Nickel thin film layers are deposited using the sputtering technique and are separated by a dielectric layer. The material chosen for the dielectric layer is SU8 which has proper properties and also has good adhesion to Nickel. Characterization of the fabricated absorber has been performed using a terahertz spectroscopy system, and the experimental results verified the high absorption of the sample.

Keywords
Terahertz
Metamaterial absorber
THz Imaging
Detectivity
Wideband absorption
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