EventsThe 3rd International Electronic Conference on Catalysis Sciences
Published
This submission belongs to the session D. Electrocatalysis of the event The 3rd International Electronic Conference on Catalysis Sciences
Published date
21 Apr, 2025
Academic Editor
author-avatarDonald Tryk
Citation
Dr. Elias Assayehegn, Dr. Serhii Vorobiov, Dr. Peter Čendula, Dr. Vladimir Komanicky, Optimized magnetron-sputtered CuFeO₂ thin films for PEC water spitting application, in Proceedings of The 3rd International Electronic Conference on Catalysis Sciences, 23 April–25 April 2025, MDPI: Basel, Switzerland
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Optimized magnetron-sputtered CuFeO2 thin films for PEC water spitting application

Dr. Peter Čendula 4
Dr. Vladimir Komanicky 3
1. Department of Chemistry, College of Natural and Computational Sciences, Mekelle University, P.O. Box 231, Mekelle city, Ethiopia, Ethiopia
2. Faculty of Science, Pavol Jozef Šafárik University, Park Angelinum 9, 04001 Košice city, Slovakia
3. Faculty of Science, Pavol Jozef Šafárik University, Park Angelinum 9, 04001 Košice city, Slovakia, Slovakia
4. Institute of Aurel Stodola, University of Žilina, Komenskeho 843, 03101, Liptovský Mikuláš, Slovakia, Slovakia
Abstract

CuFeO2 (CFO) has been recently identified as a promising photocathode material for photoelectrochemical (PEC) water splitting. However, this p-type semiconductor suffers from poor photo-induced electron–hole separation and charge collection. In this study, CFO thin films were successfully sputtered via a magnetron sputtering technique, and their PEC experiments were carried out under front-side chopped illumination in 1M NaOH electrolyte against a Ag/AgCl reference electrode. In argon, the thin films produced low photocurrent, while in oxygen, it enhanced the photocurrent and rose to 0.55 mAcm-2 at 0.4 V vs. RHE (VRHE). The synthesis parameters dictated the water splitting efficiency; when the power of the Fe target increased from 160 W to 200 W, the photo-current density enhanced and reached the highest value of 0.55 at 0.4 V vs. RHE (VRHE) due to its lower charge transfer resistance according to EIS data. Similarly, the Cu power was optimized in which the highest J-V was produced with a power of 40 W rather than 60 and 80 W. The other constituent of CFO that affects the PEC activity is oxygen; an oxygen flow rate of 2 sccm (with O2:Ar = 1:9) was optimal; increasing this further reduced the J-V. AFM spectroscopy revealed that the roughness of the thin films increased as a function of Fe and Cu sputtering power, whereas SEM-EDAX inferred a homogeneous distribution of the elemental constituents.

Keywords
CuFeO2
Water splitting
Thin films
Magnetron sputtering
Photoelectrochemical
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