EventsThe 1st International Online Conference on Technologies
Published
This submission belongs to the session S4. Manufacturing Technologies of the event The 1st International Online Conference on Technologies
Published date
06 Nov, 2026
Academic Editor
author-avatarEugene Wong
Contribution&Funding
Conceptualization,
[Riccardo Cesaro] ; [Azin Soleymani Tameh] ; [Roberto Bernasconi]
Methodology,
[Azin Soleymani Tameh] ; [Riccardo Cesaro] ; [Roberto Bernasconi]
Validation,
[Azin Soleymani Tameh] ; [Roberto Bernasconi]
Investigation,
[Azin Soleymani Tameh] ; [Riccardo Cesaro] ; [Roberto Bernasconi]
Resources,
[Roberto Bernasconi]
Data curation,
[Azin Soleymani Tameh] ; [Roberto Bernasconi]
Writing - original draft,
[Riccardo Cesaro] ; [Roberto Bernasconi] ; [Azin Soleymani Tameh]
Visualization,
[Azin Soleymani Tameh]
Supervision,
[Roberto Bernasconi]
Project administration,
[Roberto Bernasconi]
Funding: --
Citation
Azin Soleymani Tameh, Riccardo Cesaro, Roberto Bernasconi, Inkjet-Assisted Lithography and Electroforming of Complex Micromagnets for Advanced Magnetic Devices, in Proceedings of The 1st International Online Conference on Technologies, 11 November–13 November 2026, MDPI: Basel, Switzerland
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Inkjet-Assisted Lithography and Electroforming of Complex Micromagnets for Advanced Magnetic Devices

Azin Soleymani Tameh 1
Riccardo Cesaro 1
image
1. Dipartimento di Chimica, Materiali e Ingegneria Chimica “Giulio Natta”, Politecnico di Milano, Milano, 20133, Italy
Abstract

Introduction

Inkjet printing (IJP) is a versatile, accurate, and material-efficient deposition technique that is increasingly employed in advanced manufacturing. Beyond direct material deposition, IJP can be used to fabricate micrometric templates for metal electroforming. In Inkjet Assisted Lithography (IAL), a UV-opaque ink is printed onto a photoresist layer and acts as a customizable photomask [1]. Although its resolution is lower than that of conventional photolithography, IAL is scalable, maskless and applicable to non-standard geometries.

Methods

This work extends the capabilities of IAL from isolated circular features [1] to complex geometrical patterns. Arrays of adjacent droplets were printed and allowed to coalesce into continuous UV-opaque structures. Particular attention was devoted to controlling droplet interaction, edge definition and mask uniformity. The resulting templates were subsequently employed for the electrodeposition of hard magnetic CoNiP and CoPtP alloys. An optimized reverse pulse plating cycle was used to promote uniform filling of the patterns and prevent layer cracking.

Results

The optimized printing conditions enabled the fabrication of continuous photomasks with arbitrarily defined micrometric geometries, overcoming the limitation of previously reported IAL approaches based on isolated droplets. After resist development and electrodeposition, well-defined CoNiP and CoPtP microstructures with minimum feature sizes of approximately 30 µm and a thickness of 10 µm were successfully obtained. The deposited features efficiently reproduced the intended geometries, demonstrating the compatibility of the templates with the electroforming of hard magnetic materials.

Conclusions

The proposed IAL-electroforming strategy provides a flexible and scalable route for producing geometrically complex micromagnets without conventional lithographic masks. The achieved feature size is suitable for applications including magnetic sensors, actuators, energy harvesting systems, and untethered microrobots. These results represent an initial step toward the fabrication of functional magnetic microdevices using a fully customizable hybrid manufacturing approach.

Bibliography

[1] R. Bernasconi et al., Appl. Mater. Today 40, 102365 (2024)

Keywords
Electroforming
micromagnets
inkjet printing
inkjet assisted lithography
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