Introduction:
Titanium-based nanostructures are attracting interest due to their significant application potential in medicine, electronics, electrical engineering and energy storage systems. They are most often obtained by top-down methods, which require the use of toxic reagents and multi-stage etching processes. In this work, titanium and carbon-based coatings were developed using an innovative hybrid method combining magnetron sputtering (MS) with radio frequency plasma-enhanced chemical vapour deposition (RF-PECVD).
Methods:
Nanolayered Ti/C coatings were fabricated on silicon substrates using a hybrid method. Titanium layers were deposited by magnetron sputtering at a constant target power of 0.23 kW, while carbon layers were deposited by RF-PECVD at a constant negative self-bias potential of −400 V. The individual sample series differed in the deposition time of the layers, enabling control of their thickness. Selected samples were subsequently annealed in a vacuum furnace at 500 °C for 1 h. Both the as-deposited and annealed samples were characterized using Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM) coupled with energy-dispersive X-ray spectroscopy (EDS).
Results:
Optical profilometry measurements confirmed the formation of coatings with thickness in the nanometer range. The obtained results indicate that the hybrid MS/RF-PECVD method enables the fabrication of nanolayered Ti/C systems with controlled layer thickness and uniform morphology. Raman spectra revealed bands characteristic of carbon structures in the 1300–1500 cm⁻¹ range (D and G bands). Signals in the region of ~300 cm⁻¹ were also detected, which may be associated with the presence of titanium compounds.
Conclusions:
Results confirm that the hybrid MS/RF-PECVD method represents a promising approach for the fabrication of controlled nanolayered Ti/C systems, which may serve as a platform for the synthesis of new two-dimensional materials.