Commercial activated carbon (AC) was subjected to acid functionalization, with a strong acid, HNO₃ (AC80 and AC90), and a weak acid, C₆H₈O₇ (ACC). The objective was to modify the surface acid-base characteristics of AC and study its effect on dispersion, metal domain size and metal-support interaction, when copper was added. Cu deposition was carried out by recirculation by impregnation of an alcoholic solution of Cu(NO₃)₂*3H₂O. Supports and catalysts were characterized by XRD, S_BET, SEM-EDS, AAS, Isopropanol Decomposition Test, Temperature Programmed Reduction and Dissociative Adsorption of N₂O. The functionalized supports showed a higher content of oxygenated functional groups (OFG), of the carboxylic, phenolic and lactonic types, than AC; being higher for AC80 and AC90. The distribution of total acid/base sites showed the same trend. S_BET decreased slightly as a consequence of the addition of GFO and/or Cu. The Cu content was higher in the functionalized supports, observing a uniform Cu distribution (elemental mapping). From XRD Cu^o and Cu₂O for Cu/AC80 and Cu° for Cu/AC90 were identified; while for Cu/ACC no Cu phase was identified. The self-reduction of Cu²⁺ to Cu⁺ and Cu^o is directly associated with the content and type of OFG present on the surface of the support. Cu/AC80 and Cu/AC90 showed a greater reduction than Cu/ACC, associated with the greater interaction with the surface of the support, in line with the phases identified by XRD. Additionally, these two catalysts presented the smallest metallic domain sizes of Cu (3.3 nm and 4.5 nm), while for Cu/ACC it was 5.8 nm.