Atomic Layer Deposition (ALD) and its variant, Molecular Layer Deposition (MLD), enable the fabrication of pure inorganic and hybrid organic–inorganic thin films with angstrom- and molecular-level precision through self-limiting vapor-phase reactions. These techniques provide nearly perfect conformality and uniformity of deposited ultrathin films, features crucial for the future of nanomaterials and sustainable surface engineering.

This contribution highlights recent advances that combine ALD/MLD with click chemistry, with research primarily focused on using azide–alkyne and thiol–ene reactions for vapor-phase and hybrid processing. The development of pulsed in situ gas-phase click reactions offers a solvent- and catalyst-free approach to functionalizing metal oxide and hybrid surfaces, overcoming major limitations of solution-based synthesis.

Furthermore, combining ALD-prepared oxide films with wet-chemical thiol–ene functionalization enables the production of nanopatterned organosilica hybrid structures with tunable surface properties. These breakthroughs demonstrate how integrating click chemistry with ALD/MLD expands the chemical toolbox for environmentally friendly nanomanufacturing and the fabrication of advanced materials for sensing applications.