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Photon Nanosieve for Ultra-Broadband and Large Tolerance Holograms
1  Institute of Materials Research and Engineering (IMRE) Agency for Science, Technology and Research (A*STAR)


Holography is of great interests to both scientific research and industry application, but has always concerned with the sensitivity to wavelength and polarization of the incident light. Photon nanosieve is a nano-hole or -void structure formed in a thin film that can affect the light field property in the far field. Having revisited the Huygens-Fresnel principle, we propose to use photon nano-sieves to mimic the forward radiation field of the point sources to ease some of the concerns from conventional and metasurface based holograms. With the help of analytical model and elaborate selection of the discrete point sources, ultrahigh capacity photon nano-sieves are designed and showed uniform optical hologram with high diffraction efficiency throughout the visible to near IR wavelength range, polarization independence and large viewing angle. This robust hologram offers a large angle-of-view and possesses a unique lensing effect, which can work as a high-resolution and lens-less micro-projector. This might open an avenue to high-tolerance holographic technique for electromagnetic and acoustic waves.